北美光刻胶和光刻胶辅助品市场预测至 2027 年 - Covid-19 影响和光刻胶类型(ArF 浸没式光刻胶、ArF 干式光刻胶、KrF 光刻胶、G 线和 I 线光刻胶)、光刻胶辅助品类型(抗光刻胶)的区域分析反射涂层、去除剂、显影剂等)、应用(半导体和 IC、LCD、印刷电路板等)以及国家/地区

Historic Data: 2016-2017   |   Base Year: 2018   |   Forecast Period: 2019-2027


No. of Pages: 137    |    Report Code: TIPRE00011578    |    Category: Chemicals and Materials

North America Photoresist and Photoresist Ancillaries Market

市场介绍

光刻胶是光敏聚合物树脂,主要用于生产印刷电路板、印刷板、平面-面板液晶显示器、磁记录头和微机电系统(MEMS)。这些组件用作掩模材料,用于通过蚀刻工艺将图像转移到下面的基板上。光刻胶辅助材料是与光刻胶一起使用的光刻胶剥离剂、抗反射涂层、显影剂和边缘珠去除剂等材料。光刻胶和光刻胶辅助材料用于制造计算机、笔记本电脑、音乐播放器中使用的多层半导体的布线配置、电话、服务器和家用电器。发达国家和发展中国家的电子工业都在稳步增长。该领域的公司在先进电话、计算机系统及相关配件、电视和家庭娱乐设备以及电子控制和监控设备等产品中使用光刻胶和光刻胶辅助产品,这些产品在许多工业和科学领域都有应用。 span>

市场概况与动态

北美光刻胶及光刻胶辅助品市场估值为666.7美元2018 年为 100 万美元,预计到 2027 年将达到 11.285 亿美元;预计在预测期内复合年增长率为 6.0%。推动市场增长的因素包括半导体行业的增长以及各种应用对光刻胶和光刻胶辅助材料的需求不断增加。然而,各机构对光刻胶辅助产品中原材料使用的监管可能会对市场增长产生负面影响。

主要细分市场

按光刻胶类型来看,2018年北美光刻胶及光刻胶辅助产品市场中,ArF浸没式光刻胶细分市场占据最大份额。在光刻胶辅助产品方面,抗反射涂层细分市场占据主导地位。 2018年光刻胶及光刻胶配套市场份额最大。从应用来看,2018年半导体及光刻胶配套市场份额最大。 ICsegment在北美光刻胶和光刻胶辅助市场中占有最大的市场份额。

主要来源和上市公司

准备北美光刻胶和光刻胶辅助设备市场报告时提到的一些主要的主要和次要来源是MERCK KGaA、Sumitomo Chemical Co., Ltd.、TOKYO OHKA KOGYO CO.、 LTD.、Micro Resist Technology GmbH、Shin-Etsu Chemical Co., Ltd.、DJ Microlaminates, Inc.、DuPont de Nemours, Inc..、Fujifilm Corporation 和 JSR Corporation。< /p>

COVID-19 大流行对光刻胶和光刻胶辅助市场的影响

与加拿大和墨西哥相比,美国记录的 Covid-19 确诊病例数量最多。这可能会影响该地区的化学工业;由于COVID-19的爆发,供应链可能会受到影响。此外,整体制造工艺、研发活动也将影响市场增长。

购买该报告的理由

  • 了解光刻胶和光刻胶辅助设备的市场格局,并确定最有可能保证丰厚回报的细分市场
  • 通过了解光刻胶和光刻胶辅助产品市场不断变化的竞争格局来保持领先
  • 有效规划并购和合作伙伴关系通过识别最有前景的细分市场来经营光刻胶和光刻胶辅助品市场
  • 通过对光刻胶和光刻胶辅助品市场各个细分市场的市场表现进行敏锐和全面的分析,做出明智的业务决策
  • 获取2018-2027年各细分市场的市场收入预测

北美光刻胶和光刻胶辅助设备市场细分

按光刻胶类型

  • ArF沉浸光刻胶
  • ArF干式光刻胶
  • KrF光刻胶
  • G-线和I线光刻胶


按光刻胶辅助类型

  • 抗反射涂层
  • 去除剂
  • 显影剂
  • 其他


按申请

  • 半导体和 IC
  • LCD
  • 印刷电路板
  • < span>其他


按国家/地区

  • 美国
  • 加拿大
  • 墨西哥


公司简介

  • MERCK KGaA
  • 住友化学株式会社有限公司
  • 东京应化工业株式会社
  • Micro Resist Technology GmbH
  • 信越化学有限公司
  • DJ Microlaminates, Inc.
  • 杜邦 de Nemours有限公司
  • 富士胶片株式会社
  • JSR Corporation


North America Photoresist and Photoresist Ancillaries Strategic Insights

Strategic insights for North America Photoresist and Photoresist Ancillaries involve closely monitoring industry trends, consumer behaviours, and competitor actions to identify opportunities for growth. By leveraging data analytics, businesses can anticipate market shifts and make informed decisions that align with evolving customer needs. Understanding these dynamics helps companies adjust their strategies proactively, enhance customer engagement, and strengthen their competitive edge. Building strong relationships with stakeholders and staying agile in response to changes ensures long-term success in any market.

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North America Photoresist and Photoresist Ancillaries Report Scope

Report Attribute Details
Market size in 2018 US$ 666.7 Million
Market Size by 2027 US$ 1,128.5 Million
Global CAGR (2018 - 2027) 6.0%
Historical Data 2016-2017
Forecast period 2019-2027
Segments Covered By 光刻胶类型
  • ArF 浸没式光刻胶
  • ArF 干式光刻胶
  • KrF 光刻胶
  • G 线和 I 线光刻胶
By 光刻胶辅助材料类型
  • 防反射涂层
  • 去除剂
  • 显影剂
By 应用
  • 半导体和集成电路
  • 液晶显示器
  • 印刷电路板
Regions and Countries Covered 北美
  • 美国
  • 加拿大
  • 墨西哥
Market leaders and key company profiles
  • MERCK KGaA
  • Sumitomo Chemical Co., Ltd.
  • TOKYO OHKA KOGYO CO., LTD
  • Micro Resist Technology GmbH
  • Shin-Etsu Chemical Co., Ltd
  • DJ Microlaminates, Inc.
  • DuPont de Nemours, Inc.
  • Fujifilm Corporation
  • JSR Corporation
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    North America Photoresist and Photoresist Ancillaries Regional Insights

    The regional scope of North America Photoresist and Photoresist Ancillaries refers to the geographical area in which a business operates and competes. Understanding regional nuances, such as local consumer preferences, economic conditions, and regulatory environments, is crucial for tailoring strategies to specific markets. Businesses can expand their reach by identifying underserved regions or adapting their offerings to meet regional demands. A clear regional focus allows for more effective resource allocation, targeted marketing, and better positioning against local competitors, ultimately driving growth in those specific areas.

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    The List of Companies - North America Photoresist and Photoresist Ancillaries Market

    The List of Companies - North America Photoresist and Photoresist Ancillaries Market

    1. MERCK KGaA
    2. Sumitomo Chemical Co., Ltd.
    3. TOKYO OHKA KOGYO CO., LTD
    4. Micro Resist Technology GmbH
    5. Shin-Etsu Chemical Co., Ltd
    6. DJ Microlaminates, Inc.
    7. DuPont de Nemours, Inc.
    8. Fujifilm Corporation
    9. JSR Corporation
    Frequently Asked Questions
    How big is the North America Photoresist and Photoresist Ancillaries Market?

    The North America Photoresist and Photoresist Ancillaries Market is valued at US$ 666.7 Million in 2018, it is projected to reach US$ 1,128.5 Million by 2027.

    What is the CAGR for North America Photoresist and Photoresist Ancillaries Market by (2018 - 2027)?

    As per our report North America Photoresist and Photoresist Ancillaries Market, the market size is valued at US$ 666.7 Million in 2018, projecting it to reach US$ 1,128.5 Million by 2027. This translates to a CAGR of approximately 6.0% during the forecast period.

    What segments are covered in this report?

    The North America Photoresist and Photoresist Ancillaries Market report typically cover these key segments-

  • 光刻胶类型 (ArF 浸没式光刻胶, ArF 干式光刻胶, KrF 光刻胶, G 线和 I 线光刻胶)
  • 光刻胶辅助材料类型 (防反射涂层, 去除剂, 显影剂)
  • 应用 (半导体和集成电路, 液晶显示器, 印刷电路板)
  • What is the historic period, base year, and forecast period taken for North America Photoresist and Photoresist Ancillaries Market?

    The historic period, base year, and forecast period can vary slightly depending on the specific market research report. However, for the North America Photoresist and Photoresist Ancillaries Market report:

  • Historic Period : 2016-2017
  • Base Year : 2018
  • Forecast Period : 2019-2027
  • Who are the major players in North America Photoresist and Photoresist Ancillaries Market?

    The North America Photoresist and Photoresist Ancillaries Market is populated by several key players, each contributing to its growth and innovation. Some of the major players include:

  • MERCK KGaA
  • Sumitomo Chemical Co., Ltd.
  • TOKYO OHKA KOGYO CO., LTD
  • Micro Resist Technology GmbH
  • Shin-Etsu Chemical Co., Ltd
  • DJ Microlaminates, Inc.
  • DuPont de Nemours, Inc.
  • Fujifilm Corporation
  • JSR Corporation
  • Who should buy this report?

    The North America Photoresist and Photoresist Ancillaries Market report is valuable for diverse stakeholders, including:

    • Investors: Provides insights for investment decisions pertaining to market growth, companies, or industry insights. Helps assess market attractiveness and potential returns.
    • Industry Players: Offers competitive intelligence, market sizing, and trend analysis to inform strategic planning, product development, and sales strategies.
    • Suppliers and Manufacturers: Helps understand market demand for components, materials, and services related to concerned industry.
    • Researchers and Consultants: Provides data and analysis for academic research, consulting projects, and market studies.
    • Financial Institutions: Helps assess risks and opportunities associated with financing or investing in the concerned market.

    Essentially, anyone involved in or considering involvement in the North America Photoresist and Photoresist Ancillaries Market value chain can benefit from the information contained in a comprehensive market report.